CIRCUIT-INTERNAL CHARACTERIZATION OF MMICs USING TWO-DIMENSIONAL ELECTRO-OPTIC FIELD MAPPING IN COMBINATION WITH MICROWAVE CAD TECHNIQUES
G. David, R. Tempel, A. Ising, Y. Kalayci, I. Wolff, D. Jäger
CIRCUIT.INTERNAL CHARACTERIZATION OF MMICs USING TWO-DIMENSIONAL ELECTRO.OYflC FIELD MAPPING IN COMBINATION WITH MICROWAVE CAD TECHNIQUES G. David a), R. Tempelb)"A.Jsing a), Y. Kala~ci b), I. Wolffb).c~, and.D.Jager a) Gerhard-MercatQr-Univ.erSitlit GH Duisburg, Sonderforschungsbereich 254 a) FG Optoelektron~k, KommandantenstraBe 60, [)-47048 pu~sburg, Germany b) IMST, Moerser StraBe 316, D-47475