MICROWAVE HEATING FOR VLSI PROCESSING
R. Buchta, G. Böling, F. Sellberg, D. Sigurd
MICROWAVE HEATING FOR VLSI PROCESSING R. Buchta, G. Boling, F. Sellberg, D. Sigurd" ABSTRACT Rapid Thermal Processing (RTP) will be necessary to meet the limited temperature budget in submicron VLSI manufacturing. In this paper we present a reactor concept for LPCVD and other thermal processes, utilizing microwave energy to heat silicon wafers to the required temperature. The reactor, in the form