EuMIC: A Three-Layer Resist Process for T- and (Gamma)-Gates in High Electron Mobility Transistor Fabrication
S. Riedmuller, J.-C. Jacquet, M. Madel, C. Chang, G. Callet, S. Piotrowicz, S. Delage, J. Grunenputt, H. Blanck, F. Scholz
Proceedings of the 13th European Microwave Integrated Circuits Conference
A three-layer resist process for T- and ?-gates in
high electron mobility transistor fabrication
S. Riedmüller1,4,#, J-C. Jacquet3, M. Madel1, C. Chang2, G. Callet2, S. Piotrowicz3, S. Delage3,
J. Gruenenpuett1, H. Blanck1, F. Scholz4
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2
United Monolithic Semiconductors GmbH, Wilhelm-Runge-Straße 11, 89081 Ulm, Germany
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