GAAS: SiGe:C HBT Technology for Advanced BiCMOS Processes
P.H.C. Magnee, G.A.M. Hurkx, P. Agarwal, W.D. van Noort, J.J.T.M. Donkers, J. Melai, E. Aksen, T. Vanhoucke, M.N. Vijayaraghavan
SiGe:C HBT technology for advanced BiCMOS processes.
P. H. C. Magn´ e, G. A. M. Hurkx, P. Agarwal, W. D. van Noort, J. J. T. M. Donkers, J. Melai, e E. Aksen, T. Vanhoucke, M. N. Vijayaraghavan
Philips Research Leuven, Kapeldreef 75, B-3001 Leuven, Belgium, peter.magnee-philips.com
Abstract-- In this paper we discuss the present status of SiGe:C heterojunction bipolar transistors (HBTs), together